Fabrication of Suspended C-NEMS Structures by EB Writer and Pyrolysis Method

Carbon microand nanostructures has received widespread interest recently due to their potential applications in biomedical devices, chemical sensors, and microelectronics. In this work, we successfully fabricated carbon-micro and nano electromechanical systems (CMEMS/NEMS) by UV/EB lithography and pyrolysis method. Our starting material is a negative photoresist, SU-8. We tried to solve charging problem by forming a thin metal layer before EB writing using various methods, such as EB evaporation, sputtering system and thermal evaporation. By partly depositing a thin layer of a metal to prevent the repelling of negative charged electrons, we have successfully formed various suspended carbon structures, such as bridges and networks.